Learning Objectives

At the end of this simulation, you will be able to:

Gain knowledge of the core steps in the photolithography process, including mask alignment, light exposure, and resist development.
Use virtual labs to observe and analyze the purpose and impact of each photolithography step on semiconductor wafer processing.
Interact with virtual tools to operate photolithography machines, such as mask aligners and exposure units.
Practice adjusting alignment, exposure time, and focus settings to achieve optimal photoresist application and pattern transfer.
Receive real-time feedback on key metrics like mask alignment accuracy, resist coating uniformity, and exposure fidelity.
Analyze the effects of different exposure and alignment adjustments to ensure precise pattern transfer onto semiconductor wafers.

How do virtual labs work?

Enhance students' involvement in science by immersing them in interactive learning scenarios. Create simulations for experiments, provide hands-on training in laboratory techniques, and convey theoretical concepts through captivating visual experiences to improve their overall long-term learning outcomes.

Access web-based simulations that are compatible with laptops, Chromebooks, tablets, and iPads, eliminating the need for software installation.
Incorporate a teacher dashboard for automated grading and monitoring of student progress.
Utilize embedded quizzes to assist students in mastering scientific content.
Comprehensive repository of educational materials, including learning resources, lab reports, videos, theory pages, graphics, and more.

Relevant Course Packages All Course Packages →

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