Learning Objectives

At the end of this simulation, you will be able to:

Learn the fundamental concepts of plasma generation, ion interactions, and surface modification in semiconductor fabrication.
Explore key plasma processes like reactive ion etching (RIE) and plasma-enhanced chemical vapor deposition (PECVD).
Use virtual tools to control plasma etching and deposition parameters, including gas flow rates, RF power, pressure, and temperature.
Adjust system parameters in real time and observe their effects on material surface interactions, etching precision, and deposition uniformity.
Engage in scenarios where students fine-tune plasma processing conditions to suit different materials, device geometries, and process requirements.
Analyze how variations in gas composition, RF energy, and pressure levels impact adhesion, uniformity, and feature resolution.

How do virtual labs work?

Enhance students' involvement in science by immersing them in interactive learning scenarios. Create simulations for experiments, provide hands-on training in laboratory techniques, and convey theoretical concepts through captivating visual experiences to improve their overall long-term learning outcomes.

Access web-based simulations that are compatible with laptops, Chromebooks, tablets, and iPads, eliminating the need for software installation.
Incorporate a teacher dashboard for automated grading and monitoring of student progress.
Utilize embedded quizzes to assist students in mastering scientific content.
Comprehensive repository of educational materials, including learning resources, lab reports, videos, theory pages, graphics, and more.

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