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Learning Objectives

At the end of this simulation, you will be able to:

Learn the purpose and significance of measurement and inspection in semiconductor fabrication, focusing on material and device analysis.
Explore key metrology concepts like critical dimensions, surface roughness, and film thickness.
Use interactive virtual tools to simulate the operation of Scanning Electron Microscopes (SEM), Atomic Force Microscopes (AFM), and profilometers.
Practice adjusting instrument parameters and settings to achieve accurate and reliable measurements.
Conduct virtual measurements to determine film thickness, surface roughness, and critical dimensions of semiconductor devices.
Interpret data to assess material characteristics, performance, and compliance with manufacturing specifications.

How do virtual labs work?

Enhance students' involvement in science by immersing them in interactive learning scenarios. Create simulations for experiments, provide hands-on training in laboratory techniques, and convey theoretical concepts through captivating visual experiences to improve their overall long-term learning outcomes.

Access web-based simulations that are compatible with laptops, Chromebooks, tablets, and iPads, eliminating the need for software installation.
Incorporate a teacher dashboard for automated grading and monitoring of student progress.
Utilize embedded quizzes to assist students in mastering scientific content.
Comprehensive repository of educational materials, including learning resources, lab reports, videos, theory pages, graphics, and more.

Metrology and Measurement Techniques Simulation

Relevant Course Packages All Course Packages →

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Advanced Machining Techniques (5-Axis Machining, EDM)

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LMS Integration

imaginX seamlessly integrates with leading LMS (Learning Management Systems), enabling educators to track student performance and allowing students to maintain their work records. It is compatible with popular platforms such as Canvas, Blackboard, Moodle, Google Classroom, Schoology, Sakai, Brightspace/D2L, and can also be used independently of an LMS.